?photolithography

photolithography 發(fā)音

英：[[?f??t?l?'θ?gr?f?]]　　美：[[?fo?to?l?'θ?gr?f?]]

英：　　美：

photolithography 中文意思翻譯

photolithography 短語(yǔ)詞組

1、photolithography lcd ─── 光刻液晶顯示器

2、photolithography fem ─── 光刻有限元法

3、photolithography barc ─── 光刻機(jī)

4、photolithography chip ─── 光刻芯片

5、photolithography pbo ─── 光刻pbo

6、photolithography diy ─── 光刻diy

7、photolithography array ─── 光刻陣列

photolithography 詞性/詞形變化，photolithography變形

形容詞: photolithographic |副詞: photolithographically |

photolithography 相似詞語(yǔ)短語(yǔ)

1、photolithographs ─── n.影印石版畫(huà)；照相平版印刷品；vt.影印石版

2、photolithographing ─── n.影印石版畫(huà)；照相平版印刷品；vt.影印石版

3、photolithographic ─── adj.光刻法的；照相平版印刷的

4、photomicrography ─── n.顯微照相術(shù)；顯微攝影術(shù)

5、photolithographer ─── n.影印石版畫(huà)；照相平版印刷品(photolithograph的變形)

6、autolithography ─── n.直接平版印刷法

7、chromolithography ─── n.石版或鋅版套色印刷術(shù)；彩色石印術(shù)

8、photolithographed ─── n.影印石版畫(huà)；照相平版印刷品；vt.影印石版

9、photolithograph ─── n.影印石版畫(huà)；照相平版印刷品；vt.影印石版

photolithography 常見(jiàn)例句（雙語(yǔ)使用場(chǎng)景）

1、The develop of Fourier storage photolithography system[J]. ─── 引用該論文 浦東林,陳林森,解劍鋒,沈雁.

2、Keywords Silicon;Silica;Etching rate;Photolithography; ─── 硅;二氧化硅;腐蝕速率;光刻術(shù);

3、Let modern ultra high precision (optical resolution 5000DPI above) scanner or Photolithography can no longer reproduce maintop pattern lines can control scan. ─── 讓古板超矮精度(平教不合辨率5000DPI以上)掃描儀或拍照制版也不克不及表現(xiàn)版紋的線條不離可以不攻掃描。

4、The most prevalent procedure is to use photolithography or electron-beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer. ─── 最常用的步驟是用光蝕刻或電子束蝕刻法，在矽晶圓表面的光阻層上制作出圖案。

5、relaxed registration photolithography ─── 不嚴(yán)格對(duì)準(zhǔn)光刻

6、The experiments show that the diffraction error can be eliminated with lens array photolithography method and high-quality grating can be developed. ─── 實(shí)驗(yàn)表明透鏡陣列光刻法，可以較好的消除衍射誤差，研制出高質(zhì)量的光柵。

7、laser photolithography ─── 激光光刻

8、First, consider the advantages and disadvantages of photolithography. ─── 首先，想想光蝕刻法的優(yōu)點(diǎn)跟缺點(diǎn)。

9、There has been a great interest in such structured films due to its potential applications in photolithography, near field microscopy and photonic devices. ─── 這種結(jié)構(gòu)的金屬薄膜在光印刷、近場(chǎng)顯微鏡和光子器件等方面有著廣泛的應(yīng)用前景，近年來(lái)引起了人們的重視。

10、BARC Process Used for Sub-micrometer Photolithography ─── BARC工藝在亞微米光刻中的應(yīng)用

11、Premium Wafer - A wafer that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring. ─── 測(cè)試晶圓片-影印過(guò)程中用于顆粒計(jì)算、測(cè)量溶解度和檢測(cè)金屬污染的晶圓片。

12、One of the procedures used in making monolithic integrated circuits which overcomes this problem is photolithography based on photoresists. ─── 用于做克服這問(wèn)題的獨(dú)塊巨石的集成電路的過(guò)程之一是基于光致抗蝕劑的照相平版印刷。

13、Experimental Study on Pupil Filtering Projection Photolithography ─── 光瞳濾波投影光刻實(shí)驗(yàn)研究

14、Implementation Methods for Wave-Front Division in Maskless Laser Interference Photolithography ─── 波前分割無(wú)掩模激光干涉光刻的實(shí)現(xiàn)方法

15、laser direct writing photolithography ─── 激光直寫光刻

16、Design and construction of an ultrahigh vacuum evaporation equipment for atom photolithography ─── 原子光刻用超高真空蒸發(fā)設(shè)備的設(shè)計(jì)和建立

17、The Status of Photolithography Development at Huahong NEC in a Cleanroom Environment and HHNEC's View on the Process Easiness for 0.13 um, 0.09 um, and 0.065 um Gate Photolithography ─── 華虹NEC潔凈室環(huán)境中的光刻技術(shù)研發(fā)現(xiàn)狀以及華虹對(duì)0.13微米、0.09微米、和0.065微米門電路光刻難易程度的觀點(diǎn).

18、But because conventional photolithography becomes more difficult as the dimensions of the structures become smaller, manufacturers are exploring alternative technologies for making future nanochips. ─── 但由于結(jié)構(gòu)變得更小后，傳統(tǒng)的光蝕刻法變得更難做，因此業(yè)者正在找尋其他技術(shù)，以做出未來(lái)的奈米晶片。

19、Optical proximity correction for improving pattern quality in submicron photolithography ─── 光學(xué)鄰近校正改善亞微米光刻圖形質(zhì)量

20、photolithography area ─── 光刻區(qū)

21、Experts think, according to the rule of physics, make more careful microprocessor technology will be at the beginning of next centuries with current photolithography technology develop acme. ─── 專家們認(rèn)為,根據(jù)物理學(xué)的規(guī)律,用目前的照相平版工藝制造更精細(xì)的微處理器技術(shù)將在下世紀(jì)初發(fā)展到頂點(diǎn)。

22、Keywords nanotechnology;development trend;photolithography;chip; ─── 納米技術(shù);發(fā)展趨勢(shì);光刻印刷芯片;

23、Electron beam lithography lays down circuit patterns more slowly than photolithography does, because it generates patterns serially instead of in parallel. ─── 電子束微影制程布設(shè)電路圖樣時(shí)，比光刻技術(shù)慢，因?yàn)樗且匝蚨瞧叫蟹绞疆a(chǎn)生圖樣。

24、One of the procedures used in making monolithic integrated circuits which overcomes this problem is photolithography based on photoresists. ─── 規(guī)程的當(dāng)中一個(gè)被使用在做整體集成電路克服這個(gè)問(wèn)題是石版影印根據(jù)光致抗蝕劑。

25、photolithography array ─── 光版印制陣列

26、Digital photolithography ─── 數(shù)字光刻

27、The parylene anchor with very deep semi sphere recess is fabricated utilizing the dry film photolithography technique. ─── 聚對(duì)二甲基苯固定器擁有一個(gè)非常深的半圓形溝槽，這是運(yùn)用乾式薄膜光阻的技術(shù)制作而成。

28、Due to the diffracting limitation of the photolithography, imprint lithography technology, which maybe next generation lithography technology, is described. ─── 針對(duì)微納制造中光刻環(huán)節(jié)的光衍射限制,討論了可能成為下一代光刻技術(shù)路線的壓印光刻。

29、photolithography limitation ─── 光刻極限

30、screenless photolithography ─── 無(wú)網(wǎng)照相平印

31、Auto-controlled Liquid Crystal Light Valve Arrays as Photolithography Shutter ─── 自控液晶光閥組式光刻快門研究

32、Research of Mask Division for Improving the Edge Sharpness of Photolithography ─── 掩模分形提高光刻邊緣銳度的研究

33、Design and Development of Control Circuit of Liquid Crystal Light Valve Arrays as Photolithography Shutter ─── 液晶光閥組式光刻快門控制電路的研究與設(shè)計(jì)

34、First, consider the advantages and disadvantages of photolithography. ─── 首先，想想光蝕刻法的優(yōu)點(diǎn)跟缺點(diǎn)。

35、photolithography photoetching method ─── 光刻法

36、In Fig. 3B, avidin protein was printed by photolithography onto a biotinylated PSI surface. ─── 三號(hào)乙，抗生物素蛋白印刷光刻到生物防擴(kuò)散表面。

37、The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division. ─── 無(wú)掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。

38、Implementation Methods for Amplitude Division Maskless Laser Interference Photolithography ─── 振幅分割無(wú)掩模激光干涉光刻的實(shí)現(xiàn)方法

39、The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division. ─── 摘要無(wú)掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。

40、photolithography simulation ─── 光刻模擬

41、photolithography technique ─── 光刻工藝

42、Contact-mode photolithography was used for realizing the monolithic integration of 0. ─── 采用光學(xué)接觸式光刻方式，實(shí)現(xiàn)了單片集成0。

43、Photolithography: forming electrodes in the form required on the ITO film. ─── 光刻:在ITO表面形成要求形狀的電極。

44、Premium Wafer- A wafer that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring. ─── 測(cè)試晶圓片-影印過(guò)程中用于顆粒計(jì)算、量溶解度和檢測(cè)金屬污染的晶圓片。

45、Lectures and laboratory sessions focus on basic processing techniques such as diffusion, oxidation, photolithography, chemical vapor deposition, and more. ─── 課堂講授和實(shí)驗(yàn)課重點(diǎn)介紹了基本制程技術(shù)，如擴(kuò)散、氧化、光刻、化學(xué)氣相沉積等。

46、Introduction to semi-conductor 2. Manufacturing technique of wafer disc 3. Thermal process and photolithography 4. Plasma and ion implantation 5. Etching process ─── 半導(dǎo)體導(dǎo)論2.晶圓制造3.加熱及微影制程4.電漿與離子布植5.蝕刻制程

47、The principle for eliminating the diffraction error of photolithography with lens array is demonstrated by optical transfer function method. ─── 用光學(xué)傳遞函數(shù)方法說(shuō)明了透鏡陣列消除光刻中衍射誤差的原理。

48、Adapting rolled-carbon chicken wire to the standard photolithography and etching process that patterns and removes material to form electrical circuitry proved just as daunting. ─── 要將捲縮的碳網(wǎng)制作成電路，光刻和蝕刻制程已經(jīng)證實(shí)是困難重重。

49、To create intricate patterns of many different types of bacteria, Weibel borrowed a technique from the computer chip industry called photolithography. ─── 為了精細(xì)地制造各種不同的細(xì)菌排列，Weibel借用了計(jì)算機(jī)芯片制造中的微影技術(shù)。

50、These multidimensional structures with nano- and micrometer features that integrate photolithography, replica molding and physical self-assembly are useful in micro- and nanofabrication. ─── 這種多尺度的復(fù)合結(jié)構(gòu)將光刻技術(shù)、復(fù)制模鑄和物理自組裝等有效結(jié)合，廣泛應(yīng)用于微納制造領(lǐng)域。

51、Alignment Precision - Displacement of patterns that occurs during the photolithography process. ─── 套準(zhǔn)精度-在光刻工藝中轉(zhuǎn)移圖形的精度。

52、ultraviolet radiation photolithography ─── 紫外光刻

53、photolithography area dispatching ─── 光刻區(qū)調(diào)度

54、Analysis of nanometrology and atom photolithography[J]. ─── 引用該論文 張文濤,李同保.

55、Because these forms of radiation have much shorter wavelengths than the ultraviolet light currently used in photolithography, they minimize the blurring caused by diffraction. ─── 由于這類型輻射的波長(zhǎng)遠(yuǎn)較現(xiàn)在光蝕刻使用的紫外光來(lái)得短，因此可以減少因繞射而造成的模糊。

56、Transmission phase gratings with continuous relief structures are fabricated with one step direct laser writing grayscale photolithography. ─── 利用一步激光直寫灰階光刻方法制作了具有連續(xù)浮雕結(jié)構(gòu)的透射式相位光柵。

57、Various technical improvements have made it possible to push the limits of photolithography. ─── 各種技術(shù)若能改進(jìn)，便可推進(jìn)光蝕刻法的極限。

58、Simulation and experiments show that for point array or hole array patterns with the same sizes maskless interference photolithography is much simple than the traditional photolithography. ─── 模擬和實(shí)驗(yàn)結(jié)果表明，對(duì)點(diǎn)陣或孔陣圖形，在同樣的圖形尺度下，無(wú)掩模干涉光刻比傳統(tǒng)光刻簡(jiǎn)單得多。

59、step-and-scan photolithography ─── 步進(jìn)掃描光刻機(jī)

60、Keywords Accelerator;Nucleophilic reaction;Polymer film;Photolithography; ─── 誘蝕劑;親核反應(yīng);聚合物膜;光刻;

61、contact photolithography ─── 接觸光蝕刻

62、Fabrication process of the sensor is introduced, especially the double alignment in the photolithography. ─── 分析了比較信號(hào)平均效應(yīng)對(duì)兩種膜型的影響。

63、that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring. ─── 測(cè)試晶圓片-影印過(guò)程中用于顆粒計(jì)算、量溶解度和檢測(cè)金屬污染的晶圓片。

64、projection photolithography ─── 投影光刻法

65、Why not use photolithography to make nanostructures? ─── 為什麼不使用光蝕刻法制造奈米結(jié)構(gòu)？

66、single step photolithography ─── 單步光刻

67、With 300 lines of Photolithography and screen resolution, with cyberctm indosinian. ─── 如果拔取300線網(wǎng)屏的特技拍照制版，不離可得回有動(dòng)感的印不敗品了。

68、One embodiment of the present invention provides techniques and systems for determining modeling parameters for a photolithography process. ─── 一種用于為光刻工藝確定參數(shù)的方法，所述方法包括：接收布局；

69、precision photolithography ─── 精密光刻

70、A picture made by photolithography. ─── 照相平版印刷品由照相平版術(shù)制成的照片

71、Both CRTs and LCDs achieve such precision with photolithography, in which a projected light image creates a pattern for laying out a material design. ─── CRT以及LCD采用光刻技術(shù)來(lái)做到這點(diǎn)，這種方法利用投射的光學(xué)影像來(lái)配置材料設(shè)計(jì)的圖案。

72、Application of Semiconductor Photolithography in Biochip Fabrication ─── 半導(dǎo)體光刻技術(shù)在生物芯片制作中的應(yīng)用

73、Keywords Micro &nano-pattern;photolithography;reaction-induced phase separation; ─── 光刻;反應(yīng)性相分離;微納米圖形;

74、New Filtering Approach on Partial Coherent Imaging System for Improving Photolithography Resolution ─── 部分相干分?jǐn)?shù)域?yàn)V波改善光刻分辨率新方法

75、Removal of Pixel Structures by Optimizing the Parameters of Imaging System in Digital Photolithography[J]. ─── 引用該論文 郭小偉,杜驚雷,陳銘勇,杜春雷.

76、Keywords Photolithography;Digital Mask;DMD;Grayscale;Microlens;Enzyme Etching; ─── 光刻技術(shù);數(shù)字掩模;數(shù)字微鏡裝置;灰度;微透鏡;酶刻蝕;

77、Photoresists or anti reflective coating for photolithography process; ─── 黃光微影製程使用的光刻膠和抗反射塗層；

78、Spherical aberration can damage image quality in photolithography. ─── 球面像差能破壞光刻的成像質(zhì)量。

79、In integrated circuits, the defects associated with photolithography are assumed to be the shape of circular discs in order to perform the estimation of yield and fault analysis. ─── 摘要現(xiàn)有成品率及關(guān)鍵面積估計(jì)模型中，假定缺陷輪廓為圓，而70%的實(shí)際缺陷輪廓接近于橢圓。

80、Why not use photolithography to make nano structures? ─── 為什么不使用光蝕刻法制造奈米結(jié)構(gòu)？

81、Keywords nanometrology;transfer standard;atom photolithography; ─── 納米計(jì)量;納米傳遞;原子光刻;

82、Several data recording methods of WMOC ROM are experimentally explored including the laser direct writing, photolithography and mould stamping. ─── 根據(jù)模壓法提出了兩種波導(dǎo)多層只讀光卡制作工藝：軟刻印法和邊緣粘合法。

83、How to use the measured effective diffusion length and scanner illumination condition to demonstrate photolithography line width uniformity is introduced. ─── 介紹了如何通過(guò)測(cè)量得出的等效擴(kuò)散長(zhǎng)度和光刻機(jī)的照明條件來(lái)對(duì)任何光刻工藝的線寬均勻性進(jìn)行評(píng)估。

84、Photolithography shutter ─── 光刻快門

85、photolithography mask ─── 光刻版

86、Effect of distortion of mask on photolithography pattern quality ─── 畸變的掩模對(duì)光刻圖形質(zhì)量的影響

87、A process called photolithography defines the ion-activated regions with patterns of light and acid etching to make transistors [see illustration on page 55]. ─── 若想在晶圓上擠入更多的電晶體，就必須選擇波長(zhǎng)更短的光束。