?lithography

lithography 發(fā)音

英：[l??θɑ?ɡr?fi]　　美：[l??θ?ɡr?fi]

英：　　美：

lithography 中文意思翻譯

lithography 常用詞組

electron beam lithography ─── 電子束曝光；電子束蝕刻

optical lithography ─── 光學(xué)平板刻法，光學(xué)制版

lithography 詞性/詞形變化，lithography變形

形容詞: lithographic |名詞: lithographer |動(dòng)詞過(guò)去式: lithographed |動(dòng)詞現(xiàn)在分詞: lithographing |副詞: lithographically |動(dòng)詞第三人稱單數(shù): lithographs |動(dòng)詞過(guò)去分詞: lithographed |

lithography 短語(yǔ)詞組

1、photo lithography ─── 光刻技術(shù)

2、electron beam lithography ─── [電子]電子束曝光； ─── [電子]電子束蝕刻

3、lithography roll ─── [化] 平印膠輥; 石印膠輥

4、lithography machine ─── 光刻機(jī)

5、lithography cof ─── 平版印刷

6、lithography cis ─── 光刻cis

7、electron-beam lithography ─── 電子束光刻 ─── 電子束平印術(shù)

8、offset lithography ─── [計(jì)] 平版膠印, 平版膠印術(shù)

9、lithography solutions ─── 光刻解決方案

10、lithography EBR ─── 光刻EBR

11、optical lithography ─── 光學(xué)平板刻法， ─── 光學(xué)制版

lithography 相似詞語(yǔ)短語(yǔ)

1、mythography ─── n.神話集；神話藝術(shù)

2、dittography ─── n.重復(fù)的誤寫(xiě)；字母門(mén)的印重

3、lithographic ─── adj.平版的；平版印刷的

4、lithographed ─── 平版印刷

5、lithograph ─── n.平版印刷；vt.用平版印刷術(shù)印刷

6、orthography ─── n.正確拼字；正字法；正字學(xué)

7、lithographs ─── n.平版印刷；vt.用平版印刷術(shù)印刷

8、lithographer ─── n.石版家；石印工

9、lipography ─── 字母的脫漏

lithography 常見(jiàn)例句（雙語(yǔ)使用場(chǎng)景）

1、Previously talked about lithography business card printing and membership card making ink balance is the formation of a stable, slightly emulsibility innovativeink. ─── 后背已講到平版制卡和會(huì)員卡制息的火不朱不均是形不敗慘輕的穩(wěn)不退的乳化油不朱。

2、Lithography - The process used to transfer patterns onto wafers. ─── 光刻-從掩膜到圓片轉(zhuǎn)移的過(guò)程。

3、A sheet molded with hundreds of perforations, from 10 to 100 microns across, can be manufactured using soft lithography and set down on another surface. ─── 他們可以利用軟微影術(shù)制造一片東西，上面戳有數(shù)百個(gè)直徑10~100微米的小孔，然后將之覆蓋在另一表面上。

4、a printmaker who uses lithography. ─── 使用平版印刷術(shù)的版畫(huà)復(fù)制匠。

5、The development of microelectronics has been driving the lithography development. ─── 微電子技術(shù)的發(fā)展一直是光刻設(shè)備和技術(shù)發(fā)展與變革的動(dòng)力。

6、A novel technique,the multi layered media technology,has been successfully developed to fabricate T shaped gate of pseudomorphic high electron mobility transistor(PHEMT)by X ray lithography. ─── 半導(dǎo)體器件日益向高頻、高速方向發(fā)展,贗質(zhì)結(jié)高電子遷移率晶體管以其高頻、高速、低噪聲受到人們重視而發(fā)展迅速。

7、Broadband catadioptric UV lithography lenses design[J]. ─── 引用該論文 張雨?yáng)|,鄒海興,王之江.

8、The lithography systems maker also said it sees strong and continuous structural demand” for its products. ─── 阿斯麥公司還表示，旗下產(chǎn)品的需求會(huì)出現(xiàn)持續(xù)的強(qiáng)勢(shì)增長(zhǎng)。

9、Compact Plasma Focus (CPF) device (NX2) operating in neon with high performance and high repetition rate is developed and used as an intense Soft X-Ray (SXR) source for microelectronics lithography. ─── 我們研制了一套以微電子光刻為應(yīng)用背景的緊湊型高重復(fù)率、高性能、工作氣體為氖氣的等離子焦點(diǎn)裝置(NX2)做為軟X射線源。

10、He also experimented with many other artistic forms, such as engraving, lithography, water colors, pastels, and painting over copper. ─── 他也做了許多藝術(shù)性的實(shí)驗(yàn)，例如雕刻，平版印刷，水彩，粉臘筆，以及在銅板上作畫(huà)。

11、The art or process of printing color pictures from a series of stone or zinc plates by lithography. ─── 彩色平板印刷術(shù)用一系列石板或鋅板做平板來(lái)印刷彩畫(huà)的技術(shù)或過(guò)程

12、raster scan electron beam lithography ─── 光柵掃描電子束光刻

13、To improve the fabrication technology of photoelectrical encoder,the laser lithography method was introduced. ─── 為了改進(jìn)光電碼盤(pán)的制作工藝,提高效率,降低成本,提出了一種光電碼盤(pán)的光刻方法。

14、At nineteen, Winslow learned the process of lithography. this work was the only formal training that Winslow had ever received in art. ─── 十九歲時(shí)，溫斯洛學(xué)會(huì)了平板印刷的程序，這是溫斯洛在藝術(shù)領(lǐng)域曾經(jīng)接受的最為正規(guī)的訓(xùn)練。

15、S10 Nano-imprint lithography system is an online digital publishing development of monochrome continuous inkjet solutions. ─── S10壓印系統(tǒng)是一個(gè)為在線數(shù)碼出版開(kāi)發(fā)的單色連續(xù)噴墨解決方案。

16、T. H. P. Chang, Proximity Effect in Electron-Beam Lithography, J. Vac. Sci. Technol., B, Vol. 12, No. 6, p. 1271, 1975. ─── 吳玫貞,電子束微影鄰近效應(yīng)參數(shù)測(cè)定與鄰近效應(yīng)修正之研究,交通大學(xué)應(yīng)化所碩士論文,1997.

17、This paper presents a novel UDSM lithography process modeling flow using layout contours. ─── 提出了一種新穎的利用版圖輪廓的超深亞微米光刻工藝建模流程。

18、The principles of LIGA process on mask, X-ray lithography, electroform and model were analyzed. ─── 對(duì)LIGA工藝掩膜、X射線光刻、電鑄及塑鑄等進(jìn)行了工藝原理分析。

19、A print produced by lithography. ─── 平版印刷所制的版

20、The escalating cost of these tools for conventional optical and extreme ultraviolet (EUV) lithography is driven in part by the need for complex optical sources and optics. ─── 壓印系統(tǒng)之對(duì)位重點(diǎn)有二：其一為晶圓面與母模之平行度，其中將采用氣壓方式使之自動(dòng)平行校準(zhǔn)；

21、Nano-imprint lithography and pick out the paper roller coating dental pad of paper, after surface treatments and wear-resistant overuse, and pick out the paper teeth and radiograph to replace it. ─── 壓印和傳紙滾筒上的叼紙牙墊涂層，經(jīng)過(guò)暗不天粗化辦理而耐磨不暫用，且叼紙牙和牙片可成群調(diào)換。

22、As the first step, some suitable soft lithography methods were tested, and the retention behaviors of PEG and fibronectin on gold film on glass were investigated with AFM. ─── 為此，探索了適用軟刻法，考察對(duì)細(xì)胞貼附起相反作用的聚乙二醇與纖粘蛋白等在鍍金表面上隨時(shí)間的潴留行為；

23、Of the four main printing methods, lithography is best able to retain most of the brushstroke as well as the essence of the original work. ─── 平版畫(huà)在凹凸平孔四類(lèi)版畫(huà)中最能保存原作的筆觸與韻味,本節(jié)目將介紹其特質(zhì)及制作方法。

24、In this thesis, the improvement of nanosphere lithography (NSL) and the template-assisted nanosphere lithography were both reported. ─── 中文摘要本論文的研究包括奈米球微影術(shù)的制程改進(jìn)，以及新的模板輔助奈米球微影術(shù)的制程開(kāi)發(fā)。

25、In December 2002 Sematech set up a colloquy at which 100 tool and chip manufacturers and scientific researchers gathered to compile a long worry list about immersion lithography. ─── 2002年12月，半導(dǎo)體研究聯(lián)盟召開(kāi)研討會(huì)，100多位來(lái)自儀器與晶片制造公司以及科學(xué)界的研究員齊聚一堂，列出他們認(rèn)為浸潤(rùn)式微影技術(shù)堪慮的事項(xiàng)。

26、We used Ebeam lithography to define the photonic crystal patterns and ion beam etcher for the etching process. ─── 元件制作方面，我們使用電子束微影系統(tǒng)來(lái)定義光子晶體的圖形，并用離子束蝕刻機(jī)進(jìn)行蝕刻制程。

27、The graphic arts include calligraphy and lithography. ─── 平面造型藝術(shù)包括書(shū)法和平版印刷術(shù)。

28、Kohler illumination was used in proximity lithography,and a fly s eye lens was adopted to form multi-point source in order to uniform the light intensity on the mask plane. ─── 接近式光刻中一般采用柯勒照明系統(tǒng),并采用蠅眼透鏡形成多點(diǎn)光源均勻掩模面的光場(chǎng)分布。

29、The General output each color view un skin to see if you need to empty or nano-imprint lithography. ─── 凡是輸入時(shí)每一個(gè)顏色查察可以更正一下是否需給掏空或壓印。

30、Rubberand drum and a printing plate cylinder, pressure drum Nano-imprint lithography, how much of the trilogy of the view that reasonable? ─── 橡皮滾筒與印版滾筒、不抬印滾筒之間的不張力，本相多不小為公道呢？

31、Photoresist stripping is last step of the lithography process.In order to maintain defect-free conditions for subsequent processes, photoresist must be removed completely. ─── 中文摘要光阻去除是微影制程中的最后一個(gè)步驟，其要求是光阻必須完全去除洗凈，以確保后續(xù)制程的潔凈度。

32、Second, intaglio and lithography, Printmaking is different. ─── 二 凹版與平版、凸版的不同點(diǎn)。

33、A printing plate cylinder and nano-imprint lithography drum is hard and bring pressure to bear on the surface, the deformation of after. ─── 印版滾筒和不抬印滾筒是硬性的暗地，施加不張力后是不易變形的。

34、An idiographic process flow which only needs adding two lithography steps and four implantations in the standard CMOS technology is given. ─── 提出了具體的工藝制作流程-在標(biāo)準(zhǔn)工藝的基礎(chǔ)上添加兩次光刻和四次離子注入工程，并成功進(jìn)行了流片試驗(yàn)。

35、In lithography, the sheets of paper placed under the plate and blanket to bring low surface areas up to printing height. ─── 中義平版印刷中，在印版或橡皮布下放入紙張以提高印刷面高度。

36、Electron beam lithography technique has developed in recent thirty years. It has been used in many fields such as micro fabrication. ─── 電子束曝光技術(shù)是近三十年來(lái)發(fā)展起來(lái)的一門(mén)新興技術(shù)，目前廣泛應(yīng)用于微細(xì)加工等各種領(lǐng)域。

37、When the rubber drum and nano-imprint lithography drum of high pressure, blanket of protrudent the deformation increase owing to displacement. ─── 當(dāng)橡皮滾筒與不抬印滾筒的不張力不正不小時(shí)，橡皮布的擠不縮變形位移度必將相答增不小。

38、Lithography, as used in the manufacture of ICs, is the process of transferring geometic shapes on a mask to the surface of a silicon wafer. ─── 光刻技術(shù)應(yīng)用到集成電路制造中，就是將掩模版的幾何圖形轉(zhuǎn)移到硅片表面的工藝過(guò)程。

39、The optical lithography correction techniques become key technologies in the IC designing and manufacturing of VDSM. ─── 光刻校正技術(shù)已成為超深亞微米下集成電路設(shè)計(jì)和制造中關(guān)鍵的技術(shù)。

40、Part of the chip-making process is lithography, requir... ─── [摘要]部分零件的生產(chǎn)過(guò)程是石板印刷術(shù)，需要特殊的照明。

41、We developed a two-dimensional finite element model to simulate the deformation of the imprinting materials caused by the compression of the mold in nanoimprint lithography process. ─── 中文摘要本文主要建立二維有限元素分析模型模擬奈米壓印過(guò)程中壓印材料因模具下壓所產(chǎn)生之變形。

42、This paper discusses the challenges that the submicrometer devices face and the trends in the submicrometer device technology from the pointview of lithography,isolation and metal interconnect. ─── 主要從光刻、隔離、金屬互連線三個(gè)方面討論了亞微米器件所面臨的挑戰(zhàn)及其發(fā)展趨勢(shì)。

43、However, either the word "Offset", "Litho" or "Offset-litho" is now commonly used to mean"offset lithography". ─── 但一般多用‘柯式’或‘平版’一詞代替‘間接石印’。

44、Aluminium plate A thin sheet of aluminium used in lithography as a base for plate coating after surface treatment. It is used for both surface type and deep-etch offset plates. ─── 一塊薄鋁片,經(jīng)過(guò)表面處理后作為平版印刷用的版基,以承載版面涂層。可用柯式用的平面版或深觸版。

45、Off-axis illumination for optical lithography ─── 光學(xué)光刻中的離軸照明技術(shù)

46、Nikon is also reversing its losses in lithography. ─── 尼康光刻機(jī)業(yè)務(wù)也開(kāi)始扭虧為盈。

47、As a small traditional drama, in performance, in order tolv pi , leather lithography characters, sets and props onto the stage, resulting in the image, which is "shadow. ─── 作為一種民間傳統(tǒng)的小戲，在表演時(shí)，以驢皮、牛皮刻制的人物、布景和道具搬上舞臺(tái)，造成影像，亦即“皮影戲”。

48、single- or multi-color lithography. ─── 單一或多色平版印刷術(shù)。

49、Solution: fine-tune the gripper teeth pad with Nano-imprint lithography drum edge. ─── 處置辦法：澈底調(diào)不靜遞紙牙牙墊同壓印滾筒外的隔斷。

50、For phase masks working in 248 nm wavelength can be generated by using interferometric lithography. ─── 其中我們利用干涉微影術(shù)制作應(yīng)用于波長(zhǎng)248奈米的相位光罩。

51、Imaging interferometric lithography with bidirection biased illumination[J]. ─── 引用該論文 馮伯儒,張錦,劉娟.

52、An ultra-precision alignment technique adopting a pair of special slant gratings was presented for room-temperature imprint lithography. ─── 為滿足多層冷壓印光刻中套刻的超高精度要求,提出了基于斜紋結(jié)構(gòu)光柵的對(duì)正技術(shù)。

53、As a result, the device being fabricated (and sometimes neighboring devices) may fail. soft lithography is generally more forgiving because the PDMS stamp is elastic. ─── 一般來(lái)說(shuō)，由于PDMS壓模具有彈性，使得軟蝕刻法需要的條件較為寬松。

54、J2204A off company's existing two-color lithography printing presses, J2108 off monochrome lithographic printing presses and related equipment of the system box. ─── 公司現(xiàn)有J2204A對(duì)開(kāi)雙色平版印刷機(jī)、J2108對(duì)開(kāi)單色平版印刷機(jī)及相關(guān)的制箱設(shè)備。

55、LITHOGRAPHY AND PLASMA ETCHING TECHNOLOGY ─── 光刻與等離子體刻蝕技術(shù)

56、Handbook of Micro lithography, Micromachining, and Micro fabrication. Vol.1: microlithography. ─── 微平版印術(shù)，顯微機(jī)械加工，和微制作手冊(cè)：卷一：微平版印術(shù)。

57、Dual-paper controller to protect against or prevent two or more pieces of paper into Nano-imprint lithography drum. ─── 雙紙控制器：防止或阻止雙張或多張紙張進(jìn)入壓印滾筒。

58、The positive photoresist AZ4620 was used in lithography process to exposure and develop, an elliptic cylinder onto a Si wafer. ─── 從中找出最佳參數(shù)值，作出符合模擬結(jié)果的光纖橢圓透鏡輪廓。

59、Study on imaging interferometric lithography ─── 掩模投影成像干涉光刻研究

60、At last the experiment results of the deep X-ray lithography, microelectroforming and plastic moulding at the station were presented. ─── 報(bào)道了深度同步輻射光刻、電鑄和塑鑄的實(shí)驗(yàn)結(jié)果。

61、The Fundamental Limits of Optical Lithography. ─── 光刻的限制。

62、In the liberated areas, mimeo, lithography and letterpress printing of pictures, pictorial widespread, comic books play a role in publicity and education particularly conspicuous. ─── 在解放區(qū)，油印、石印和鉛印的畫(huà)冊(cè)、畫(huà)報(bào)廣泛流傳，連環(huán)畫(huà)發(fā)揮的宣傳教育作用尤其突出。

63、A process for printing from a smooth surface, as lithography or offset. ─── 平版印刷術(shù)一種平面印刷的方法，如平版印刷術(shù)或膠印

64、Tianxi four years the Northern Song Dynasty (1020) Alexander Shuangfeng ci lithography stone Cloud Hospital. ─── 北宋天禧四年（1020）刻制敕賜雙鳳山大云院石碑。

65、We fabricate desired structured surfaces by holographic lithography, plasma etching and Teflon coating.The performance is evaluated by measuring the reflectance spectrum and contact angle. ─── 實(shí)驗(yàn)上，我們采用全像微影術(shù)、電漿蝕刻以及旋鍍鐵氟龍的方式來(lái)制作試片，并量測(cè)該試片的反射頻譜和接觸角。

66、But for the time being, chipmakers must accept the limits of conventional lithography and maintain feature sizes of at least 50 nanometers or so. ─── 不過(guò)目前晶片制造商還是得屈服在一般微影術(shù)的極限下，將線寬維持在至少50奈米左右。

67、ERS10 Nano-imprint lithography system test of commercial enterprises. ─── ERS10壓印系統(tǒng)的商用測(cè)試企業(yè)。

68、The thin film of nanotubes left after the solvent is removed can be subjected to lithography and etching that leaves the surface of the wafer with evenly spaced groupings of nanotubes. ─── 在移除溶劑后，材料表面會(huì)留下一層奈米碳管薄膜，以供進(jìn)行光刻和蝕刻，使晶圓表面分布著一束束等間距的奈米碳管。

69、ITRI MIRL has a high resolution electron beam lithography (EBL)system, which has the ability to exposure the nano-scale patterns. ─── 工研院機(jī)械所擁有之電子束直寫(xiě)機(jī)為具有高解析度微影系統(tǒng)，可用以曝寫(xiě)奈米尺寸之圖形。

70、Shanghai Optical Lithography Electronic Engeering Corp. ─── 上海光刻電子科技有限公司。

71、Then a crowbar the lock of the drum, country-by-only after careful examination of nano-imprint lithography drum body found with axial series in. ─── 接著再用小撬棒撬滾筒，不迎只澈底查抄之后，發(fā)掘不抬印滾筒體有軸向串不靜本體。

72、Extreme ultraviolet lithography (EUV), as it is known, trains 13-nanometer radiation onto a series of multilayer mirrors that reduce the size of the image projected onto the wafer. ─── 眾所周知，極紫外光微影技術(shù)（EUV）可把13奈米波長(zhǎng)的光波投射到一連串的多層膜面鏡上，以縮小晶圓上的成像。

73、In the last decade or so, lithography acceptation business card printing and membership card making speed faster and faster. ─── 不遠(yuǎn)紛歧幾年來(lái)，陡版膠印機(jī)的制卡和會(huì)員卡制息時(shí)不緩越來(lái)越遲。

74、Lithography Electro forming Micro Molding, ─── 微影鑄模成型

75、In popular IC manufactory system, Lithography is the most valuableness and critical process. ─── 在主流的IC制造工藝中，光刻是最復(fù)雜，昂貴和關(guān)鍵的工藝。

76、On the software side, the company owns three sets of advanced lithography systems, ambitious, WOP, technical force is fully capable to meet customer requirements. ─── 在軟件方面，公司擁有三套先進(jìn)的制版系統(tǒng),鴻圖、WOP， 技術(shù)力量完全能達(dá)到客戶的要求。

77、The liquid emulsion ink that is is painted or drawn on the lithographic stone in direct lithography to form theimage.Tusche can be used to effect corrections on offset plates if the run is short. ─── 乳狀液體墨,用來(lái)在石版上描繪或書(shū)畫(huà), 造成直接石印印紋.制版墨也可以用來(lái)修改印量不多的柯式印版。

78、Cylinder lining is divided into a printing plate cylinder lining and rubber cylinder lining, Nano-imprint lithography drum has no lining. ─── 滾筒包襯不分印版滾筒包襯和橡皮滾筒包襯，壓印滾筒不不安縱包襯。

79、To fabricate PC structure light emitting diodes, nanosphere lithography (NSL) is a well-known, low cost and quick preparation method. ─── 奈米球微影術(shù)是一種廣受人知，價(jià)錢(qián)低廉且迅速的方法，而此方法便可用于光子晶體結(jié)構(gòu)發(fā)光二極體的制程。

80、And printed in lithography or letterpress printing ink overprint compared to flexo business card printing and membership card making ink has great superiority. ─── 與平版或凹版油不朱的疊印比擬，剛性版制卡和會(huì)員卡制息油不朱的具有很不小的優(yōu)越性。

81、In the BOE laser direct-writing device, the adjusting effect of spindle velocity is one of the key factors for determining the lithography effectiveness and accuracy. ─── 在二元光學(xué)元件激光直寫(xiě)設(shè)備中，主軸速度調(diào)節(jié)效果的好壞是決定刻劃效率與精度的關(guān)鍵因素之一。

82、Investigation of Lithography Process in CNT-FED ─── CNT-FED中光刻工藝的研究

83、A novel metal micro-parts fabrication technology was presented herein.The anode which also served as a mask was patterned by UV lithography,and used to confine the region of electrodeposition. ─── 提出了屏蔽膜板隨動(dòng)式微細(xì)電鑄技術(shù),屏蔽陽(yáng)極膜板隨電沉積層的增加而微量移動(dòng),從而可以用厚度有限的屏蔽層制造出原理上高度不受限制的三維金屬微結(jié)構(gòu)。

84、Individual sodium titanate nanowire-based device is fabricated via e-beam lithography techniques. ─── 利用電子束光刻技術(shù)制作了基于鈦酸鈉納米線的納米器件。

85、Our facilities are as follows: a Selective Laser Sintering (SLS), a Laminated Object Manufacturing (LOM), a Stereo Lithography Apparatus (SLA), a vacuum casting machine, a 3D Scanner system and so on. ─── 中心已裝備的激光快速成形設(shè)備有：SLA(光敏樹(shù)脂固化)、SLS(激光選區(qū)粉末燒結(jié))和大型LOM(激光切紙成形)。

86、In July 2003 another Sematech workshop on immersion lithography drew a huge crowd to the IBM Almaden Research Center. ─── 2003年7月，半導(dǎo)體研究聯(lián)盟再度針對(duì)浸潤(rùn)式微影技術(shù)召開(kāi)研討會(huì)，吸引眾多與會(huì)者前往IBM的阿馬丹研究中心。

87、In lithography, a dampening solution ingredient that enables gum arabic to cling to the nonimage areas of the plate. ─── 中義在平版印刷中，使阿拉伯膠能附在非印紋部份溼潤(rùn)溶液。

88、A black liquid used for drawing in lithography and as a resist in etching and silk - screen work. ─── 制版墨一種供平版印刷繪制圖像，以及在腐蝕和絲網(wǎng)印刷時(shí)作耐蝕膜用的黑色液體

89、Lithography toolmakers had bumped up against numerous obstacles in making a machine that radiates wavelengths of 157 nanometers. ─── 微影技術(shù)工具的制造商，在制作可投射157奈米波長(zhǎng)機(jī)臺(tái)的過(guò)程中，遇到無(wú)數(shù)困難。