?photolithographic

photolithographic 中文意思翻譯

photolithographic 相似詞語(yǔ)短語(yǔ)

1、photolithography fem ─── 光刻有限元法

2、photolithography ─── n.影印石版術(shù)；照相平印術(shù)

3、photolithography lcd ─── 光刻液晶顯示器

4、photolithography chip ─── 光刻芯片

5、photolithography diy ─── 光刻diy

6、photolithograph ─── n.影印石版畫(huà)；照相平版印刷品；vt.影印石版

7、photolithography barc ─── 光刻機(jī)

8、photolithography pbo ─── 光刻pbo

photolithographic 常見(jiàn)例句（雙語(yǔ)使用場(chǎng)景）

1、The Influence of Binary Grating Illumination on Imaging Property of Photolithographic System ─── 二元光柵照明對(duì)光刻系統(tǒng)成象特性的影響

2、These filters can be fabricated by photolithographic or electro-deposition techniques with high accuracy and repeatability. ─── 這種濾波器能通過(guò)電鑄方法制造，具有準(zhǔn)確性和可重復(fù)性。

3、Integration of the system is described, the characteristics of the photolithographic imaging system are analyzed in detail. ─── 介紹了光刻投影系統(tǒng)的組合集成，詳細(xì)分析了該系統(tǒng)的成像特點(diǎn)及光學(xué)性能。

4、The excimer laser as the main light source of photolithographic device, whose energy distribution is required as homogeneous as possible. ─── 準(zhǔn)分子激光作為當(dāng)前光刻裝置的主要光源，要求其輸出激光光束強(qiáng)度分布盡量均勻。

5、taking out the photolithographic glue, make the metal hole or the metal hole array on the underlay. ─── 去掉光刻膠，在襯底上制作成金屬孔隙或金屬孔隙陣列。

6、Immobilization of Oligonucleotides on Photolithographic Gold Films and Its Analytical Applications ─── 寡核苷酸在石英金膜表面的固定及其分析性能

7、Probe into the Catalog of the Photolithographic Western Books ─── 影印版西文圖書(shū)編目探討

8、The Growing and Trend of Optical Photolithographic Technology ─── 光學(xué)光刻技術(shù)的發(fā)展歷程及趨勢(shì)

9、The structure of micro cantilever bridge, the photolithographic mask and the circuit system of the sensor is designed. ─── 從理論上闡述了微懸橋結(jié)構(gòu)氣體流速傳感器的工作原理，設(shè)計(jì)了微懸橋的結(jié)構(gòu)、工藝版圖以及其電路系統(tǒng)。

英語(yǔ)使用場(chǎng)景

Photolithographic patterning and thin film deposition were used for manufacturing multilevel diffractive optical element ( DOE ) .

This is a subtractive process that uses photolithographic techniques to define the aperture pattern, and then applies an etchant to form the apertures simultaneously from both sides of the stencil.

The principle of oblique illumination for improving photolithographic resolution and increasing depth of focus is presented with partially coherent theory.

The structure of micro cantilever bridge, the photolithographic mask and the circuit system of the sensor is designed.

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